PRODUCTS
Alloy Targets
Alloy Targets
Product
Purity
Density
Processing method
Application
Surface condition
TiAl Target
2N5

Smelting
Mainly used in vacuum coating industry.It can be used as raw material for magnetron sputtering coating.
Ground
TiAlSi Target
2N5

Smelting
Coating industry, vacuum tube gate, high temperature components of vacuum furnace, X-ray target, etc..
Ground
AlCr Target
3N
Relative density>99%
HIP
Surface strengthing for tool and mould.
Ground
TiAlCr Target
2N5
3.8g/cm3  
Smelting

Ground
TiZr Target
2N5
4.5g/cm³
Smelting
Vacuum coating, experimental or research grade titanium-zirconium target, electronics, photoelectric, military, decorative plating, functional film, etc..
Ground
55/45 Costantan
2N6

Smelting
Making precision resistance, sliding resistance, resistance strain gauge, etc..
Ground
TZM Target

10.2g/cm3
Forging 
Usually used as mould casting tools and high temperature furnace parts, such as supports, boats and trays.
Ground
CuGa Target
3N5 
8.2g/cm3
Smelting
Industrial coating,lab research .
Lathing 
CoAl Target
3N 
Relative density 90% min
HP

Ground
MoNa Target
3N5
Relative density 85% min
HP

Ground
MoCr Target
3N5
9.8g/cm3
HP
Sputtering deposition
Ground
TiSi Target
3N5

Smelting
Widely used in decoration coating, tool coating, optical coating and coating glass industry and plate display industry.
Polishing
WCu Target
3N5

Smelting
Widely used in machinery, power, electronics, metallurgy, aerospace and other industries.
Ground
SiAl Target
4N 2.362g/cm3
Smelting
Coating
Polishing
SiAl Rotary Target
2N8

Thermal Spraying
Building/automotive glass coating.
Bright
NiCr Target
2N8

Vacuum melting
Widely used in wear-resistant, anti-wear, heat-resistant and corrosion-resistant surface strengthening films.
Polishing

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