PRODUCTS
Silicon Targets
Silicon Targets
Product
Purity
Density
Melting point
Application Type
Processing method
Si Plannar Target
5N
2.33g/cm3
1420℃ 

Mainly used to reflect the preparation of SiO2 and SiN films by magnetron sputtering as important functional films.They have good hardness, optical and dielectric properties, wear resistance and corrosion resistance.It has a broad application prospect in optics, microelectronics and other fields, and is a functional material that is widely concerned in the world.At present, it is mainly used in LCD transparent conductive glass, building low-e glass and microelectronics industry.


Si tube: OD:145-160mm, ID:134-135mm,1500mm length max.; Polycrystalline;P-type Resistivity:0.005-0.02 Ohm-cm; 
CZ
Si Tube
5N
2.33g/cm3
1420℃ 
Silicon Rotary Target are widely used in thin film solar energy,large areas of building and car glass coating,display glass.It can also be used in SiO2 film process in the flat display conductive glass field. Si tube: OD:145-160mm, ID:134-135mm,1500mm length max.  Polycrystalline, P-type Resistivity:0.005-0.02 Ohm-cm
CZ
Si Rotary Target
4N
2.2g/cm3 Relative density:95% min. 1420℃ 
Silicon Rotary Target are widely used in thin film solar energy,large areas of building and car glass coating,display glass.It can also be used in SiO2 film process in the flat display conductive glass field.
Wall thickness:10mm max.;Length:3200mm max.
Thermal Spraying


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